Synthesis and Analysis of SiBCN Films Obtained by Plasma-Enhanced Chemical Vapor Deposition from Triethylaminoborane, Hexamethyldisilazane, and Ammonia Научная публикация
Журнал |
Journal of Structural Chemistry
ISSN: 0022-4766 , E-ISSN: 1573-8779 |
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Вых. Данные | Год: 2024, Том: 65, Номер: 8, Страницы: 1488-1501 Страниц : 14 DOI: 10.1134/s002247662408002x | ||
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Библиографическая ссылка:
Ermakova E.N.
, Maksimovsky E.A.
, Fedorenko A.D.
, Shapovalova A.A.
, Khizhnyak E.A.
, Kosinova M.L.
Synthesis and Analysis of SiBCN Films Obtained by Plasma-Enhanced Chemical Vapor Deposition from Triethylaminoborane, Hexamethyldisilazane, and Ammonia
Journal of Structural Chemistry. 2024. V.65. N8. P.1488-1501. DOI: 10.1134/s002247662408002x WOS OpenAlex
Synthesis and Analysis of SiBCN Films Obtained by Plasma-Enhanced Chemical Vapor Deposition from Triethylaminoborane, Hexamethyldisilazane, and Ammonia
Journal of Structural Chemistry. 2024. V.65. N8. P.1488-1501. DOI: 10.1134/s002247662408002x WOS OpenAlex
Идентификаторы БД:
Web of science: | WOS:001306474000013 |
OpenAlex: | W4402238489 |
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